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Lam Research Corporation (LRCX)

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Lam Research Corporation

4650 Cushing Parkway
Fremont, CA 94538
United States
510 572 0200
http://www.lamresearch.com

Settore/iTechnology
SettoreSemiconductor Equipment & Materials
Impiegati a tempo pieno11.700

Figure dirigenziali chiave

NomeTitoloRetribuzioneEsercitateAnno di nascita
Mr. Timothy M. ArcherPres, CEO & Director2,48M7,3M1967
Mr. Douglas R. BettingerExec. VP, CFO & Chief Accounting Officer1,27MN/D1967
Dr. Richard A. GottschoExec. VP & CTO1,11M1,18M1952
Dr. Patrick J. LordExec. VP of Customer Support Bus. Group & Global Operations868,31k104,88k1966
Mr. Seshasayee VaradarajanSr. VP & GM of Deposition Bus. Unit856,72kN/D1975
Mr. Kevin D. JenningsSr. VP of Global OperationsN/DN/D1965
Mr. Robert F. HawthorneChief Information OfficerN/DN/DN/D
Ms. Tina CorreiaCorp. VP of Investor Relations & Corp. Fin.N/DN/DN/D
Ms. Ava M. HahnSr. VP, Chief Legal Officer & Sec.N/DN/D1973
Ms. Stacey MacNeilChief Communications OfficerN/DN/DN/D
Gli importi risalgono al giorno 31 dicembre 2020 e i valori di compensazione riguardano l'anno fiscale che si chiude a tale data. La retribuzione include salari, bonus ecc. "Esercitate" è il valore delle opzioni esercitate durante l'anno fiscale. Valuta in USD.

Descrizione

Lam Research Corporation designs, manufactures, markets, refurbishes, and services semiconductor processing equipment used in the fabrication of integrated circuits in the United States, China, Europe, Japan, Korea, Taiwan, and the southeast Asia. The company offers ALTUS systems to deposit conformal films for tungsten metallization applications; SABRE electrochemical deposition products for copper damascene manufacturing; SOLA ultraviolet thermal processing products for film treatments; and VECTOR plasma-enhanced CVD ALD products. It also provides SPEED gapfill high-density plasma chemical vapor deposition (HDP-CVD) products; and Striker single-wafer atomic layer deposition (ALD) products that provide multiple dielectric film solutions. In addition, the company offers Flex for dielectric etch applications; Kiyo for conductor etch applications; Syndion for through-silicon via etch applications; and Versys metal products for metal etch processes. Further, it provides Coronus bevel clean products to enhance die yield; Da Vinci, DV-Prime, EOS, and SP to address a range of wafer cleaning applications; and Metryx mass metrology systems for high precision in-line mass measurement in semiconductor wafer manufacturing. Lam Research Corporation was founded in 1980 and is headquartered in Fremont, California.

Governance aziendale

L'ISS Governance QualityScore di Lam Research Corporation al 2 novembre 2019 è 1. I criteri di valutazione fondamentali sono revisione: 1; Consiglio di Amministrazione: 4; diritti degli azionisti: 2; retribuzione: 2.

Punteggi di corporate governance forniti da Institutional Shareholder Services (ISS). I punteggi indicano il rango decile relativo all’indice o alla regione. Un punteggio di decile pari a 1 indica un governance risk più basso, mentre un punteggio di 10 indica un governance risk più alto.