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Applied Materials, Inc. (AMAT)

NasdaqGS - NasdaqGS Prezzo in tempo reale. Valuta in USD.
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120,91+0,51 (+0,42%)
Al 01:22PM EDT. Mercato aperto.
Schermo intero
I prezzi di scambio non provengono da tutti i mercati
Chiusura precedente120,40
Denaro120,32 x 900
Lettera120,30 x 900
Min-Max giorno119,94 - 121,95
Intervallo di 52 settimane71,12 - 142,01
Media Volume6.472.054
Beta (5 anni mensile)1,59
Rapporto PE (ttm)28,92
EPS (ttm)4,18
Prossima data utili30 apr 2023
Rendimento e dividendo (forward)1,04 (0,86%)
Data ex dividendo22 feb 2023
Stima target 1A120,53
  • GlobeNewswire

    Applied Materials Increases Cash Dividend by 23.1 Percent and Announces New $10 Billion Share Repurchase Authorization

    SANTA CLARA, Calif., March 13, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today announced that its Board of Directors has approved a 23.1-percent increase in the quarterly cash dividend from $0.26 to $0.32 per share. The dividend is payable on June 15, 2023 to shareholders of record as of May 25, 2023. The Board also approved a new share repurchase authorization enabling Applied to buyback an additional $10 billion of its shares over time. This supplements the previous authorization which

  • GlobeNewswire

    Applied Materials’ New eBeam Metrology System Paves the Way to High-NA EUV Lithography

    Applied Materials VeritySEM® 10 CD-SEM Metrology System The new VeritySEM® 10 system precisely measures the critical dimensions of semiconductor device features patterned with EUV and helps pave the way to emerging High-NA EUV lithography. New VeritySEM® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. tod

  • GlobeNewswire

    Applied Materials’ Innovative Pattern-Shaping Technology Reduces the Cost, Complexity and Environmental Impact of Advanced Chip Manufacturing

    Applied Materials Centura® Sculpta® Patterning System The new Centura® Sculpta® patterning system reduces EUV double-patterning steps to lower the cost, complexity and environmental impact of leading-edge chipmaking. Pattern-shaping technology: a breakthrough innovation for the patterning engineer's toolkit. Applied Materials’ pattern-shaping technology brings an entirely new capability to chipmakers, enabling them to replace EUV double-patterning steps and reduce the cost, complexity and enviro